阐述了热处理对辐照区熔硅单晶的影响。
This paper attempts to review the effect on FZ monocrystalline silicon by annealing.
对区熔后的硅膜结构和电学性质进行了研究。
The structure and electrical properties of silicon film after ZMR are studied.
研究了区熔再结晶(ZMR)设备及其工艺特点。
ZMR (zone melting recrystallization) apparatus is introduced, and the processing characteristic of ZMR is studied.
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