...制备了纳米量级的碳薄膜材料，对它的电学性质及场发射性质进行了详细的研究。在扼要概述碳的几种同素异形体的发现、性质和用途的基础上，分析了用热灯丝化学气相沉积法(HFCVD)制备金刚石薄膜的生长机理。阐述了在金刚石薄膜生长过程中气相碳源、固相基底以及激活氢分子与原子对生成产物的影响。
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本文采用热丝化学气相沉积法(hot filament chemical vapor deposition,HFCVD),在具有复杂形状的硬质合金整体式铣刀表面沉积了一层均匀、光滑的金刚石薄膜,并采用石墨以及碳化硅铝基增...
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利用HWCVD在柔性衬底上制备多晶硅薄膜 通过热丝化学气相沉积法(Hot Wire Chemical Vapor Deposition,HWCVD),采用间歇供应硅烷气体,持续通入氢气的方式控制硅薄膜的生长,发现该方法在有机衬底上生长的薄膜结构为多...
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热丝化学气相沉积法 HFCVD ; HWCVD ; HFCVD or HWCVD ; Hot filament chemical vapor deposition
采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。
Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition (HFCVD) on glass at low-temperatures.
采用热丝化学气相沉积法在覆盖c _(60)膜的硅基片上沉积金刚石膜，研究了金刚石膜的成核与生长。
In this paper, the diamond films were grown on the C_ (60) -coated silicon substrate by using hot-filament chemical vapor deposition technique. The diamond nucleation and growth were studied.
本工作利用热丝化学气相沉积(HFCVD)法获得了(100)取向不同质量的金刚石薄膜，并制备了CVD金刚石辐射探测器。
In present work, (100) oriented CVD diamond films with different quality obtained by a hot-filament chemical vapor deposition (HFCVD) technique were used to fabricate radiation detectors.
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