This paper derived the formulation for the real efficient emission coefficient of secondary electron under the condition that high energy primary electron incident on metal obliquely.
推导出高能原电子斜入射时的金属的有效真二次电子发射系数的表达式，它与入射角的余弦近似成反比。
Field emission scanning electron microscope (FESEM) has been used to investigate the fine structure of Fe-based metal film interface and its cross-section.
采用场发射扫描电子显微镜(FESEM)，研究了铁基金属包膜界面及其断面的精细结构。
The experiment of measuring metal electron work function usually neglects the loss caused by the electron emission of tungsten filament, so the system error will be-1.86%.
在金属电子逸出功测定实验中，未考虑由钨丝电子发射引起的损耗，存在约-1.86%的系统误差。
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