... electron beam controlled discharge 电子束控制放电 electron beam density 电子束密度 electron beam machining 电子束加工 ...
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low density electron beam optics [电子] 弱流电子光学
high density electron beam optics 强流电子光学
high-density electron beam optics [光] 高密度电子束光学
Plasma electron density was increased by using the method of gas fuelling with molecular beam injection in the HL 1m tokamak.
在HL - 1m装置上用分子束注入等离子体的气体加料方法提高了等离子体的电子密度。
The results of the molecular beam injection show that the impurity have been decreased, the electron density have been increases, and the plasma confinement property was improved.
分子束注入减小了杂质辐射，有效地提高了电子密度，改善了等离子体的约束性能。
In this simulation. the density ratio of beam electron and background electron is 0.125.
数值模拟的束流密度与背景电子密度之比为0.125。数值模拟的结果说明，两者相符较好。
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