La_(0.67)Ca_(0.33)MnO_3 thin film is deposited on LaAlO3(100) single crystal substrate using radio frequency sputtering by changing annealed time, substrate temperature, sputtering pressure and sputtering power. The structure and electrical transport properties of the film are investigated systemically.
通过改变退火时间、基底温度、溅射气压、溅射功率等工艺参数,我们用射频溅射法在(100)取向的LaAlO3单晶基底上生长了La_(0.67)Ca_(0.33)MnO_3薄膜,并对薄膜的结构、电输运性质做了详细的研究。
参考来源 - 空穴掺杂稀土锰氧化物 La·2,447,543篇论文数据,部分数据来源于NoteExpress
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