ECR plasma source ECR等离子源 ; ECR等离子体源
ECR plasma deposition ECR等离子体沉积
Microwave ECR plasma 微波ECR等离子体
Microwave-ECR Plasma 微波ECR等离子体
ecr plasma modification ecr等离子体改性
ecr plasma facility ecr等离子源
method of ECR plasma CVD 电子回旋共振等离子体化学汽相沉积法
This system is applied to the measurement of microwave ECR plasma inner parameters and proved to work well.
将该系统应用于微波ecr等离子体参数的测定，经实验测试效果较好。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
Combining the optical diagnostics and composition detection of the plasmas, the mechanism of the ECR plasma treatment was discussed.
结合等离子体光学诊断和成分探测，分析讨论了ECR等离子处理机理。
应用推荐