关键词 : 脉冲激光沉积 ; 直流放电 ; GaN 薄膜 ; A lN 缓冲层 [gap=9553]Key words: pulsed laser depo sition; direct current discharge; GaN film s; A lN buffer layer
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direct-current discharge [电子] 直流放电
direct current arc discharge 直流电弧放电
Direct current glow discharge 直流辉光放电
direct-current argon discharge 直流氩放电
direct current partial discharge 直流局部放电
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
This article covers the mechanism, advantages of plasma modification, as well as generating methods of direct and alternative current glow discharge.
文中论述了等离子体表面改性的作用机理、优点，介绍了产生大气压直流辉光放电和交流辉光放电的方法。
The mechanism on direct current arc discharge has been reviewed in this paper.
本文评述了直流电弧放电机理。
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