The proximity effect in the E-beam lithography system was verified by experiments.
利用电子束曝光机完成有关邻近效应的实验。
The high speed Patten Generator is designed for nanometer E-beam lithography system.
为满足纳米级电子束曝光系统的要求，设计了高速图形发生器。
The proximity effect in the SDS-3 E-beam lithography system is verified by experiments.
利用SDS - 3电子束曝光机完成有关邻近效应的试验。
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