In argon (ar) gas, nanocrystalline silicon films are prepared by pulsed laser ablation. The influence of ambient pressure on surface morphology of nanocrystalline silicon film is studied.
采用脉冲激光烧蚀技术在氩气环境下制备了纳米硅薄膜，研究了环境气体压强对纳米硅薄膜表面形貌的影响。
The decarburization speeds up, as the ar blow rate increases, and the influence of argon flow rate on decarburization is greater in the low carbon zone.
随底吹氩气流量的增加，脱碳速度加大，此种作用在低碳区影响尤为明显。
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