直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
分析了无声放电法、高压脉冲直流放电法和接触辉光放电法低温等离子体直接处理废水技术的特点。
The characters of waste water treatments using dielectric barrier discharge, pulsed high direct voltage discharge and contact glow-discharge cold plasma are analyzed.
采用蒙特卡罗方法对氦直流辉光放电平板电极等离子体阴极鞘层内电子的输运过程进行了研究。
The electron transport process in cathode sheath of helium dc glow discharge is studied by using Monte Carlo simulation.
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