此外，B的增加显著降低了磁控溅射镀膜工艺的着火电压和维持放电电压，为实现低电压磁控溅射提供了另外一种思路。
Further more, the increase of B reduced greatly the touching off and keeping discharge voltages during magnetron sputtering coating, which gives another approach to lower voltage magnetron sputtering.
即使是低电压充放电，也可能产生大的瞬间充放电电流，这可能会导致电容器性能的损害，比如说短路或开路。
Low voltage charging or discharging may also cause deterioration of capacitor such as shorting and open due to sudden charging and discharging current.
此“ 先期放电”不但清除了部份的壁电荷还增加空间中带电荷粒子数量并使得其后产生的维持放电可于较低电压时开始。
The pre-discharge not only eliminates partial wall charges but also increases density of priming particles which help the coplanar-type discharge start at a lower cell voltage.
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