它具有工作气压高，维持电压低，阴极溅射率高等特点。
It has the characteristic of working on higher pressure and lower voltage and having a high cathode sputtering rate.
毫克每显示的直流等离子显示器中阴极溅射抑制剂中的汞含量。
Mercury used as a cathode sputtering inhibitor in DC plasma displays with a content up to 30 mg per display until 1 July 2010.
研制了一种由非蒸散型消气剂泵与冷阴极溅射离子泵组成的复合泵。
A composite pump was developed which is composed of a non evaporable getter pump and a sputtering ion pump.
设计了一种网状阴极溅射靶，它是由多个空心阴极并列交叉组合而成。
A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward.
本文研究了辉光放电离子轰击钎焊时阴极溅射现象对工件表面的净化作用。
The surface cleaning action, caused by the cathode sputtering phenomenon in ion bombardment brazing in glow discharge is investigated in this paper.
研制了一种由多个空心阴极并列组合而成的可直接作为溅射靶的多重空心阴极溅射靶。
A new multiple hollow cathode sputtering target which has a simple structure and a high sputtering rate, was put forward.
将多重空心阴极溅射靶应用于双辉离子金属渗镀试验。结果表明，这种方法可以加速金属渗镀层的形成。
The result shows that this method has a high surface alloying and deposition rate, and the multiple structure made of alloying and coating layers can be formed, in double glow suface alloying process.
分析比较了溅射离子泵、冷阴极电离超高真空计、热阴极电离超高真空计等作为真空保护传感器的不同电子学设计。
The electronic circuitry of the various vacuum protection schemes, which use sputtering ion pump or cold-cathode or hot cathode ionization gauge as sensors, was compared.
本文祥细分析了溅射型空心阴极放电(SHCD)铜离子激光器的放电、溅射特性和粒子的相互作用过程，建立了放电模型。
A discharge model on the sputtering hollow cathode discharge (SHCD) copper ion laser is established, its characteristics of discharge, sputtering and the particle interaction processes are analysed.
本发明涉及一种用于操作磁控管溅射阴极、特别是阴极管或形成 一个阵列的几个阴极管的方法。
The invention relates to a method for operating a magnetron sputter cathode, in particular a tube cathode or several tube cathodes forming an array.
首先提出真空管道自体真空镀膜新概念，采用特殊的阴极靶结构设计成功的解决了长管道内表面直流溅射镀膜的难题。
The new concept of the vacuum pipe sputter self-coating is introduced first, and special cathode target structure is introduced to get favorable coating.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。
The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
液晶显示器制造工艺中的降低反射层、透明电极、发射极与阴极等均由溅射方法形成。
Reducing reflecting layer, transparent electrode, emitter and cathode in the LCD manufacturing technology are all carried out using sputtering method.
论述了空心阴极放电时，其内部化学反应生成物的迁移、扩散、蒸发和溅射。
While hollow cathode being discharged, migration, diffusion, evaporation and sputtering of reaction products were analyzed.
一种半圆柱磁控溅射阴极，属于磁控溅射装置中的溅射源部件。
The utility model relates to a semi-circular column magnetic control sputtering cathode, belonging to a sputtering source component of a magnetron sputtering device.
介绍了设备的结构、 组成及工作过程，对新型矩形双平面磁控溅射阴极及有关的各阴极进行了分析、比较。
Describes the construction and working process of JPD-1200 we developed, and compares it with. Other cathods by discussing their different features.
介绍了设备的结构、 组成及工作过程，对新型矩形双平面磁控溅射阴极及有关的各阴极进行了分析、比较。
Describes the construction and working process of JPD-1200 we developed, and compares it with. Other cathods by discussing their different features.
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