电子束曝光技术这些优势使电子束曝光技术不仅在掩模版制作方面一直处于主流地位而且将在纳米器件的研制和生产中发挥重要作用。
All these advantages make the technology not only be in the major position but also play an important part in the research and production of nanometer device.
光刻是大规模集成电路生产流程中十分关键的一环，而光刻中使用的掩模的质量对大规模集成电路的成品率有很大的影响。
In the manufacture process of integrated circuit (IC), lithography occupy a very important step, and the quality of photomask used in lithography affects the yield of LSI.
单片机的掩模 ROM集成到单片机中，并在生产单片机时一次性编程写入。
The mask-programmed read only memory of the microcontroller is integrated into the microcontroller and programmed once and for all during manufacture of the microcontroller.
该方法采用逐个图形曝光的方式使其具有内在的并行特性，可大大提高灰度掩模的制作速度和精度，并降低生产成本。
This system has intrinsic parallel characteristic owing to its stepper exposure mode, therefore it can improve the manufacturing speed and precision of gray-scale masks with low cost.
该方法采用逐个图形曝光的方式使其具有内在的并行特性，可大大提高灰度掩模的制作速度和精度，并降低生产成本。
This system has intrinsic parallel characteristic owing to its stepper exposure mode, therefore it can improve the manufacturing speed and precision of gray-scale masks with low cost.
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