• 介绍了加工工艺过程

    The technology procedure of silicon nitride ball is introduced.

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  • 氮化硅粉料表面基团种类数量制备工艺生产厂家的不同有明显的差异。

    On the particle surface, and that species and amount of theses surface groups varied with production methods and manufacturers.

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  • 现阶段几种粉体制备方法存在很多不足因此采用燃烧合成工艺制备氮化硅粉体。

    In several methods to prepare silicon nitride powder there exist some shortages in the present, so self-propagating high temperature synthesis is developed for fabricating the powder.

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  • 氮化波导进行的工艺实验表明,实验结果理论分析很好的一致性。

    The experiment results on silicon nitride waveguide are in good agrement with the theoretical analysis.

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  • 阐述结合碳化硅窑具材料生产技术、生产工艺流程使用情况

    The productive technology and productive flowsheet of Si3N4 bonded SiC kiln furniture materials were introduced in this paper, and the serving situation has been investigated.

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  • 利用等离子体增强气相沉积PECVD工艺不同射频功率,不同反应气压条件下制备了化硅薄膜。

    SiN thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) under various power and pressure conditions.

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  • 利用等离子体增强气相沉积PECVD工艺不同射频功率,不同反应气压条件下制备了化硅薄膜。

    SiN thin films are deposited by plasma enhanced chemical vapor deposition (PECVD) under various power and pressure conditions.

    youdao

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