在抗病品系中，CH1和CH2有较高的本底表达水平，且CH2和CH3在胞间积累的速度也明显快于感病品系。
In resistant lines, the constitutive expression of CH1 and CH2 was more strong and the accumulation of CH2 and CH3 in intercellular Spaces was faster than in susceptible ones.
在抗病品系中，CH1和CH2有较高的本底表达水平，且CH2和CH3在胞间积累的速度也明显快于感病品系。
In resistant lines, the constitutive expression of CH1 and CH2 was more strong and the accumulation of CH2 and CH3 in intercellular Spaces was faster than in susceptible ones.
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