光刻-从掩膜到圆片转移的过程。
Lithography % - The process used to transfer patterns onto wafers.
光掩膜是半导体和精密加工的必要成分。
A photomask is an essential component for semiconductor manufacturing and microfabrication.
然后利用掩膜腐蚀方法在铸层上腐蚀出微排气通道。
Then, a micro exhaust duct was etched on an electroforming deposit through mask etching technology.
通过磁控溅射法制备了锑基铋掺杂超分辨掩膜材料。
Antimony-based bismuth-doped thin film, a new kind of super-resolution mask layer, is prepared by magnetron sputtering.
介绍了相位掩膜特性对光纤光栅(OFG)性能的影响。
In this article the influence of phase mask characteristic on OFG performance is introduced.
采用全息法制备了光刻胶光栅，并用该光栅掩膜离子蚀刻。
Photoresist grating was fabricated by holography, and it was used in the mask of ion etching.
微反射镜和V型光纤定位槽的自对准由同一块掩膜板实现。
The device is composed of a vertical mirror, a cantilever and V-grooves.
本发明提供一种保护掩膜板的方法，所述掩膜板包括：衬底；
此图显示的就是光掩膜，上面印有将打印到硅晶片上的图案。
Shown here is a photomask, which bears the patterns that will be printed onto a wafer.
平板印刷室里面点着黄色的灯，避免光掩膜与紫外线相互干扰。
The lithography room is lit with yellow light to avoid interference with the UV light used with the photomasks.
掩膜板上图形的像被投影到许多厘米以外的涂有抗蚀剂的片子上。
An image of the patterns on the mask is projected onto the resist-coated wafer , which is many centimeters away.
在LIGA技术研究中提出了一次掩膜成型法，简化了工艺过程；
Single step mask fabrication process is developed for LIGA technology, which made mask-making process simplified.
本发明提供的方法可以充分保护掩膜板，提高掩膜板的质量和使用寿命。
The method can sufficiently protect the mask so as to improve the quality of the mask and prolong the service life of the mask.
同时，本文还就图像感兴趣区域掩膜生成的问题进行了一些总结和推广工作。
Furthermore, the paper summarizes and extends the problem of the generation of ROI mask.
采用此公式和探针的原位参数对掩膜板的AF M线宽测量结果进行了修正。
The amendment expressions and the effective parameters have been utilized to amend the result of the AFM linewidth measurement on a microelectronic mask.
硅片的一部分经掩膜后进行SF6干法刻蚀，从而使集流器能够连接到外电路上。
Part of the silicon layer was masked and dry etched with SF6 gas to allow connection of the current-collector to the outside circuit.
根据传统相位掩膜板的设计原理，从两个方面对原有的相位掩膜板表达式进行扩展。
The original expression for phase mask plate can be extended according to the design principle of traditional phase mask plate.
介绍了用相位掩膜方法制作光纤布拉格光栅(FBG)以及镀金的FBG温度传感器。
Fiber Bragg gratings (FBG) prepared in terms of a phase mask technique and the FBG temperature sensor with plating gold were introduced.
提出了基于等高面和基于灰度量化的两种实时掩膜产生方法，编制了相应的计算软件；
Two methods based on the contour plane and the descritized gray scales for real-time mask are proposed and the relevant software for the techniques is developed.
组合材料芯片技术是用一系列掩膜在同一块基片上获得含不同参数单元样品面阵的方法。
Combinatorial material chip technology provides a new way to fabricate multi-element arrays with different parameters on the same substrate by using a series of masks.
第三章给出了等截面悬臂梁微开关的微机械加工工艺，设计了掩膜版及具体的工艺参数。
Chapter three: Presents the fabrication process of micro-switch with cantilever beam and designed the masks.
随后打印台面向下移动几分之一毫米的距离，然后放置不同的掩膜后，再重复上述操作。
The print table is then lowered by a fraction of a millimetre and the process repeated, with a different mask if required.
在同步辐射X射线光刻中，由于掩模的初始张应力和掩膜的非均匀受热将使掩模产生热畸变。
In synchrotron radiation X-Ray lithography, distortion of mask is caused by its initial tension, stress and inhomogeneous thermal effect.
介绍了飞秒激光加工光电倍增管电极，修复光刻掩膜，诱导白炽灯丝阵列微孔等一些工业应用。
Some industrial applications including micromachining dynodes of photomultipliers, repairing photomask of lithography, fabricating array micro-holes in incandescent filaments, etc. are introduced.
对信号进行外延后进行EMD，然后利用掩膜信号对IMF分量进行延拓后再进行希尔伯特变换；
We extend the data before using EMD, and then we extend the IMF based on making signal before using Hilbert transformation.
根据测量的树脂的特性值，使用实验室开发的微反射镜动态掩膜微立体光刻系统，成功制作微齿轮。
According to the two values, a micro-gear was fabricated by projection microstereolithography system using digital micro mirror dynamic mask.
根据测量的树脂的特性值，使用实验室开发的微反射镜动态掩膜微立体光刻系统，成功制作微齿轮。
According to the two values, a micro-gear was fabricated by projection microstereolithography system using digital micro mirror dynamic mask.
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