该研究对于化学镀基底材料的表面处理具有重要意义。
This study is significant to surface treatment of substrate in electroless deposition.
以金属作为基底，环氧树脂作为涂层材料，采用电化学阻抗谱技术研究表面未经处理、经硅烷处理和经磷化处理试样的环氧涂层酎蚀性能。
The anticorrosion behavior of untreated, silane treated and phosphating treated metal surface on metal is studied, and the epoxy resin is used as coating.
结果显示利用氩氢等离子体对金基底材料表面进行处理能有效地提高铜沉积层的均一性。
The results show that Ar-H2 plasma treatment of the Au substrate leads to a significant enhancement of the uniformity of the copper deposition layer.
结果显示利用氩氢等离子体对金基底材料表面进行处理能有效地提高铜沉积层的均一性。
The results show that Ar-H2 plasma treatment of the Au substrate leads to a significant enhancement of the uniformity of the copper deposition layer.
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