研究了反应磁控溅射的动力学过程。
The kinetic process of reactive magnetron sputtering has been studied.
反应磁控溅射被广泛应用于制备化合物薄膜。
Reactive magnetron sputtering was used to prepare many kinds of compound films extensively.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
阐述了影响激光反射膜损伤阈值的因素以及反应磁控溅射制备高阈值激光反射膜的优势。
The factors that affect the damage threshold and the advantage of RMS in laser reflective film preparation are also discussed.
本文采用直流反应磁控溅射工艺，以金属钨为靶材，在玻璃和单晶硅片上沉积了WO 3薄膜。
In this paper, WO3 thin film was deposited on glass substrate and silicon slice by DC reactive magnetron sputtering and using metal tungsten as target.
采用铟锡合金靶(铟锡，90 -10)，通过直流反应磁控溅射在玻璃基片上制备出ito薄膜，并在大气环境下高温退火处理。
Tin doped indium oxide (ITO) films were deposited on glass substrates by reactive magnetron sputtering using a metallic alloy target (in Sn, 90 10).
本文采用反应磁控溅射法和溶胶凝胶法制备了均匀致密的三氧化钨薄膜材料，对它的光学性质、表面形态、结构等进行了深入的研究。
The effects of low-power(LP) buffers on the structural properties of ZnO thin films deposited under high power by RF magnetron sputtering have been investigated.
多种工艺可以用来制备透明导电薄膜，如磁控溅射真空反应蒸发、化学气相沉积、溶胶-凝胶法以及脉冲激光沉积等。
Many processes are used to prepare transparent conductive films, such as magnetron sputtering, vacuum reactive evaporation, chemical vapor depositions, Sol-gel, laser-pulsed deposition.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
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