研究了所制备薄膜的厚度、颗粒度等与薄膜制备过程中激光脉冲频率、引弧电压和靶材—衬底间距等工作参数之间的对应关系。
We studied the relationship between the films thickness, grain size and deposition parameters, i. e. pulse laser frequency, striking voltage and distance from the target to the substrate.
研究了所制备薄膜的厚度、颗粒度等与薄膜制备过程中激光脉冲频率、引弧电压和靶材—衬底间距等工作参数之间的对应关系。
We studied the relationship between the films thickness, grain size and deposition parameters, i. e. pulse laser frequency, striking voltage and distance from the target to the substrate.
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