摘要本文综述了国内外脉冲工艺在电弧离子镀和磁控溅射中的应用。
ABSTRACT the application of pulse technique on arc ion plating and magnetron sputtering is summarized in the article.
针对脉冲偏压电弧离子镀技术，分析了影响基体沉积温度的各项因素及其影响程度。
The influencing factors and their weights on deposited temperature have been studied in detail during pulsed bias arc ion plating (PBAIP).
本文利用基于虚拟仪器的朗缪尔双探针系统对电弧离子镀等离子体进行了诊断研究。
The Langmuir double probe system based on Virtual Instrument was used to diagnose arc ion plating plasmas.
本文介绍了新型硬质涂层和硬质涂层沉积技术中电弧离子镀和磁控溅射镀技术的新进展。
Makes a survey about the recent develpment of new deposition techniques for hard thin film coatings.
本实用新型涉及薄膜制备领域，具体地说是一种新型的改善电弧离子镀沉积工艺的动态磁控弧源装置。
The utility model relates to a novel dynamic magnetic control arc source device for improving the arc ion plating deposition technique, belonging to the film making field.
离子能量是影响脉冲真空电弧离子镀镀膜质量的一个重要参数，因而测量真空电弧中离子的能量非常重要。
Ion energy is an important parameter influencing the quality of films by pulsed vacuum arc ion deposition, so it is very necessary to measure the ion energy of pulsed arc.
通过实验、仿真模拟和理论计算，验证了建立的电弧离子镀等离子体负载的宏观电路模型及其与等离子体微观参数间的关系是有效的。
It is validated by experiments, simulation and theoretic calculation that the macroscopical circuit model of plasma load of AIP and its relationship with microcosmic parameters of plasma is effective.
电弧或溅射离子镀高的离化率为脉冲工艺提供了最好的应用条件。
Arc ion plating or magnetron sputtering provides the best application condition for pulse technique.
一种新的镀膜技术——电弧放电离子镀研制成功。
A new coating technology, arc discharge ion plating has been developed.
一种新的镀膜技术——电弧放电离子镀研制成功。
A new coating technology, arc discharge ion plating has been developed.
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