• The invention discloses a method for fabricating CMOS image sensor, capable of increasing the adhesion between an interlayer insulating film and a photoresist pattern.

    公开一种制造CMOS图像传感器方法其能提高层间绝缘与光致抗蚀剂之间粘附力

    youdao

  • A CMOS image sensor and a method for fabricating the same are disclosed, in which the boundary between an active region and a field region is not damaged by ion implantation.

    公开了一种CMOS图像传感器及其制造方法其中活性效应区之间边界离子注入损坏

    youdao

  • A CMOS image sensor and a method for fabricating the same are disclosed, in which the boundary between an active region and a field region is not damaged by ion implantation.

    公开了一种CMOS图像传感器及其制造方法其中活性效应区之间边界离子注入损坏

    youdao

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