The invention discloses a method for fabricating CMOS image sensor, capable of increasing the adhesion between an interlayer insulating film and a photoresist pattern.
公开一种制造CMOS图像传感器的方法,其能提高层间绝缘膜与光致抗蚀剂之间的粘附力。
A CMOS image sensor and a method for fabricating the same are disclosed, in which the boundary between an active region and a field region is not damaged by ion implantation.
公开了一种CMOS图像传感器及其制造方法,其中在活性区与场效应区之间的边界未被离子注入损坏。
A CMOS image sensor and a method for fabricating the same are disclosed, in which the boundary between an active region and a field region is not damaged by ion implantation.
公开了一种CMOS图像传感器及其制造方法,其中在活性区与场效应区之间的边界未被离子注入损坏。
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