The plasma dry etching method is of evidently-reduced damage to the electrical performance of the allium nitride.

这样等离子体干法蚀刻对氮化镓的电气性能的损伤有显著降低。

youdao

The plasma dry etching method is of evidently-reduced damage to the electrical performance of the allium nitride.

这样等离子体干法蚀刻对氮化镓的电气性能的损伤有显著降低。

youdao