Using 193-nm with double patterning will force chip makers to use "more restrictive design rules," he said.
因为193 nm液浸式光刻技术与双重成像的结合将迫使芯片产商对芯片设计准则设置更多的限制。
All patterns in the standard cells having the second indicator are transferred to a second mask of the double patterning mask set.
以及将所述第二图案组中的图案转印到所述双图案掩模组的第二掩模。
All patterns in the standard cells having the second indicator are transferred to a second mask of the double patterning mask set.
以及将所述第二图案组中的图案转印到所述双图案掩模组的第二掩模。
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