A modified light diffusion solution model was proposed from a heuristic version of beam spreading (BS) model and diffusion approximation (DA) theory.
受到光束扩散模型和漫射近似理论的启发，提出了一种改进的光传输求解模型。
Because temperature rise of the exposed region must meet the requirement of diffusion experiment, high power density of the incident laser beam is necessary.
要使曝光区温度达到扩散实验要求，必须使曝光区功率密度很高。
An ethylene diffusion flame has been investigated at normal pressure using synchrotron vacuum ultraviolet (VUV) photoionization and molecular-beam mass spectrometry.
本文利用探针取样法结合同步辐射真空紫外光电离和分子束质谱技术研究了常压下的乙烯扩散火焰。
By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.
通过对电子束扩散函数与显影对比度的分析，本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。
By analyzing the spread function and development contrast curve, we hypothesized that the resolution limit of electron-beam lithography is primarily limited by developer-diffusion.
通过对电子束扩散函数与显影对比度的分析，本文认为电子束曝光的分辨极限与显影液在纳米尺度下的扩散限制有关。
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