Smooth ZnO thin films have been obtained by in situ oxidation of Zinc films on mica surfaces.
在云母基底上热蒸镀锌膜， 再采用简单的原位氧化方法制备氧化锌薄膜。
The effects of low-power(LP) buffers on the structural properties of ZnO thin films deposited under high power by RF magnetron sputtering have been investigated.
本文采用反应磁控溅射法和溶胶凝胶法制备了均匀致密的三氧化钨薄膜材料，对它的光学性质、表面形态、结构等进行了深入的研究。
ZnO thin films can be used to fabricate transparency electrode, piezoresistor, cell battery window, surface acoustic wave device, gas sensor and light-emitting diode etc.
它可以被用来制作透明电极、压敏电阻、太阳能电池窗口、表面声波器件、气体传感器、发光二极管等。
Time behaviors of the stimulated emission under relatively high pumping intensity, spontaneous emission, and laser pulses were compared, and hence the stimulated emission of ZnO thin films was proved.
比较了较高激发密度下的受激发射、自发发射和激光脉冲的时间特性，这些都证实了该发射是受激发射。
This letter demonstrates that the insulating ZnO films can be deposited by DC sputtering from oxygen-deficient ZnO targets to lower the cost of thin film solar cells.
本工作表明使用贫氧靶材直流溅射制备的高阻透明氧化锌薄膜可以应用于薄膜太阳能电池并有效地降低其成本。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
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