And all of the foundries utilize similar equipment, which includes deep reactive ion etch tools and wafer bonders.
所有芯片制造厂都使用类似的设备，包括深反应离子蚀刻工具和晶片键合机。
Low voltage high current reactive ion plating is a new progress in the field of optical thin films deposition techniques.
光学薄膜低压大电流反应离子镀技术是近年来光学薄膜技术领域中的最新进展。
The influence of chamber pressure, gas flow rate and RF power on micro loading effect in reactive ion etch of silicon dioxide is researched.
对二氧化硅反应离子刻蚀中反应室压力，刻蚀气体流量和射频功率等因素对刻蚀速率和刻蚀均匀性的影响进行了研究。
It can be used for single ion implantation, ion beam mixing, single ion or reactive ion beam sputter-deposition and ion beam enhanced deposition.
可用于单离子注入，离子束混合，单离子或反应离子束溅射淀积以及离子束增强淀积。
This accelerometer is fabricated by N type silicon wafer. To obtain high aspect ratio structure, deep reactive ion etching(DRIE) process is employed.
加速度计用普通的N型硅片制造，为了刻蚀高深宽比的结构，使用了深反应离子刻蚀（DRIE）工艺。
Yak hairs were treated by the microwave electron cy cl otron resonance plasma reactive ion etching(ECR-RIE) equipment to improve its property of weave.
采用微波电子回旋共振等离子体反应离子刻蚀（E CR-R IE）装置对牦牛毛纤维进行表面改性，从而改善牦牛毛的可纺性。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
The gated silicon field emitter arrays (FEA) with small gate aperture have been successfully fabricated by dry etching, including ion beam etching (IBE) and reactive ion etching (RIE).
利用离子束刻蚀(IBE)和反应离子刻蚀(RIE)等干法刻蚀方法来制造带栅极的场发射阴极阵列。
The select ion of reactive monomer and oxyethylene group number, molecular weight of copolymer and its distribution, influence of terminal group and the amount of reducing agent added were discussed.
通过对近年来国内外的文献综合，讨论了反应单体、聚氧烷基链和端基的选择、聚合物相对分子质量及其分布、减水剂添加量等对减水剂性能的影响因素。
This passage introduced how to develop the new flocculants (PFZSS) for wastewater treatment through adding iron(III) ion zinc(II) ion in the silicic acid and controlling the reactive condition.
本文在聚硅酸中同时引入铁、锌两种金属离子，控制好工艺条件，研制新型水处理药剂——聚硅酸硫酸铁锌（PFZSS）。
High quality ITO films are prepared onto K9 glass substrates by oxygen ion-assisted electron beam reactive evaporation.
采用氧离子辅助电子束反应蒸发工艺在K9玻璃基底上制备了性能优异的ITO薄膜。
A patterned DLC thin film cathode was fabricated by reactive -ion etching method and mic ro -fabrication technology.
通过离子束技术和微细加工技术可以实现DLC薄膜的图形化并能大大提高薄膜的场发射性能。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
High quality ITO transparent conductive film was prepared by reactive low voltage ion plating technique, which is different to the most common sputtering method to deposit ITO film.
溅射镀膜方法是制备ito透明导电膜最常用也是实验研究最多的方法。
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