The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both.
可成像元件还包含辐射吸收性化合物和耐溶剂聚合物，所述聚合 物含有聚合物主链和磷酸侧基、金刚烷基侧基或这两种侧基。
The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both.
可成像元件还包含辐射吸收性化合物和耐溶剂聚合物，所述聚合 物含有聚合物主链和磷酸侧基、金刚烷基侧基或这两种侧基。
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