A metal-oxide secondary emission film can be deposited on glass, ceramic or semiconductor substrates by thermal decomposition of an organo-metal alkoxide.
利用某些有机烷氧基金属化合物的热分解,可在玻璃、金属、陶瓷或半导体基片上沉积相应的金属氧化物次级发射膜。
A metal-oxide secondary emission film can be deposited on glass, ceramic or semiconductor substrates by thermal decomposition of an organo-metal alkoxide.
利用某些有机烷氧基金属化合物的热分解,可在玻璃、金属、陶瓷或半导体基片上沉积相应的金属氧化物次级发射膜。
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