• The third stage etching in current method is a time-fixed etching, which easily causes under etching or over etching of the metal layer.

    现有刻蚀形成金属线时第三阶段刻蚀采用了固定时间的刻蚀,极易造成金属刻蚀不足刻蚀的问题。

    youdao

  • The influence on over etching and under etching to IC layout is analyzed, the computation model and realization method of IC critical area are presented.

    论文在分析刻蚀欠刻蚀IC版图影响基础提出了基于工艺偏差影响的IC关键面积计算模型实现方法

    youdao

  • Characteristic: Xeno? III Single Step Self etching Dental Adhesive avoids sensitivity by sealing dentinal tubules and eliminating problems of over drying and over - etching of dentin.

    特点异种?三单腐蚀密封避免敏感牙本质小消除问题干燥和酸本质。

    youdao

  • Experimental results show that the polishing process includes the steps of etching, brightening and over-etching. The mechanism are also discussed.

    结果表明,黄铜化学抛光包括浸蚀光亮过腐蚀三个阶段,同时对黄铜化学抛光机理进行了探讨。

    youdao

  • Experimental results show that the polishing process includes the steps of etching, brightening and over-etching. The mechanism are also discussed.

    结果表明,黄铜化学抛光包括浸蚀光亮过腐蚀三个阶段,同时对黄铜化学抛光机理进行了探讨。

    youdao

$firstVoiceSent
- 来自原声例句
小调查
请问您想要如何调整此模块?

感谢您的反馈,我们会尽快进行适当修改!
进来说说原因吧 确定
小调查
请问您想要如何调整此模块?

感谢您的反馈,我们会尽快进行适当修改!
进来说说原因吧 确定