Deep? Sub? Micron optical lithography process is facing more and more serious challenge.
深亚微米光学光刻工艺技术目前面临着越来越严重的挑战。
Third, laser crystals emitting at UV and visible regions for color displaying and optical lithography.
面向全色显示、光刻等应用的蓝绿紫和可见光激光晶体；
The optical lithography correction techniques become key technologies in the IC designing and manufacturing of VDSM.
光刻校正技术已成为超深亚微米下集成电路设计和制造中关键的技术。
With the continuous improvement of optical lithography limit resolution, the current lithography tool is facing with more and more serious challenge.
随着光学光刻极限分辨率的不断提高，当代光学光刻设备正面临着越来越严重的挑战。
Image quality is the key performance of the optical lithography tool and it relies on the performance of wafer focusing and leveling measurement system.
成像质量是光学光刻机的最主要指标，硅片调焦调平测量是光刻机控制成像质量的基础。
Vector diffraction theory is applied for the investigation of the effects of the polarization state of the illumination light on the aerial images in the optical lithography.
在投影光刻中矢量衍射理论适用于研究照明光的偏振态对空间成像的影响。
This paper introduces the recent progress of optical lithography, including the concept of wavefront engineering. Some fundamental ways for optical super resolution are discussed.
对光学曝光技术的主要进展、波前工程概念和实现光学超分辨的基本途径等进行了论述。
Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.
纳米压印作为非光学的下一代光刻技术，具有分辨率高、成本低、产率高等诸多优点，因而可能应用于将来的半导体制造中。
The high cost in traditional optics lithography drives the scientists to invent new non-optical methods to replace processes currently used in IC factories.
传统光学光刻技术的高成本促使科学家去开发新的非光学方法，以取代集成电路工厂目前所用的工艺。
The large field projection lithography lens is a special optical lenses form, which put an high demands on the design and processing both for mechanical and optical.
大视场投影光刻物镜是光学系统中的一种特殊的形式，其设计加工要求高。
All-reflective optical systems, due to their material absorption and low refractive index, are used to create the most suitable devices in extreme ultraviolet lithography (EUVL).
由于材料的吸收和低折射率问题，极紫外光刻所采用的光学系统发展趋势是全反射型。
Reflective optical elements based on multilayer coatings are have entered the practical stage that take EUV lithography and EUV astrophysics as the core.
目前，基于极紫外多层膜的反射式光学元件，已经全面进入了以极紫外光刻与极紫外天文观测为核心的实用化阶段。
A new design of off-axis five mirrors optics was presented which was used to extreme-ultraviolet lithography. It was very suit for the commercialization at optical quality and free work distance.
本文探讨了一种可应用于极紫外光刻光学系统的离轴五反射镜系统，它在光学质量、自由工作距离方面满足了极紫外光刻商业化的要求。
Laser lithography is one of the main methods for manufacturing micro-optical and the binary optical masks.
激光光刻是加工微光学及二元光学掩模的主要手段。
The smallest linewidth produced by laser lithography plays an important role in the properties of the micro-optical elements.
光刻的最细线宽对所加工的二元微器件性能起决定作用。
A micron-precision optical alignment system is developed for three-dimensional Micro Electro-Mechanical System(MEMS) device fabrication based on multi-layer imprint lithography.
针对基于微压印成形三维MEMS器件制造工艺多层压印的需要，开发了一套基于视频图像对正原理的压印光刻对准系统。
The optical part can be done by applying Electron Beam Lithography (EBL), Inductively Coupled Plasma (ICP) etching, and Plasma-enhanced Chemical Vapor Deposition (PECVD).
利用电子束光刻、等离子体增强化学气相沉积、感应耦合等离子体刻蚀来实现跑道型微环谐振器的制备；
The optical part can be done by applying Electron Beam Lithography (EBL), Inductively Coupled Plasma (ICP) etching, and Plasma-enhanced Chemical Vapor Deposition (PECVD).
利用电子束光刻、等离子体增强化学气相沉积、感应耦合等离子体刻蚀来实现跑道型微环谐振器的制备；
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