Researches on the two-photon photopolymerization technology of SU8 negative photoresist have been processed.
飞秒激光su8负性光刻胶双光子聚合工艺研究。
Its optical density, with help from a metallic layer, has been achieved at 5.5. Since this organic material is a negative photoresist, the fabrication process is rather simple.
借助金属层，其光学密度已达到5.5。由于这种有机材料是负性光敏抗蚀剂，所以加工过程相当简单。
Image reversal of S - 1400 series photoresist from positive to negative has been realized by added proper imidazole in it.
本文阐术了在S-1400正胶中加入适量咪唑，使正胶不仅具有原来特性，而且经一定工艺处理后还具有负胶的功能。
Image reversal of S - 1400 series photoresist from positive to negative has been realized by added proper imidazole in it.
本文阐术了在S-1400正胶中加入适量咪唑，使正胶不仅具有原来特性，而且经一定工艺处理后还具有负胶的功能。
应用推荐