A new method for post treatment of porous silicon, sulfur passivation by microwave plasma assistance in vacuum, is reported in this paper.
报道了对多孔硅进行后处理的一种新方法，即真空中微波等离子体辅助的硫钝化处理。
A new method for post treatment of porous silicon, sulfur passivation by microwave plasma assistance in vacuum, is reported in this paper.
报道了对多孔硅进行后处理的一种新方法，即真空中微波等离子体辅助的硫钝化处理。
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