Secondly, the transient characteristics of FN tunneling and hot hole (HH) stress induced leakage current (SILC) in ultra-thin gate oxide are investigated respectively in this dissertation.
其次,本文分别研究了FN隧穿应力和热空穴(HH)应力导致的超薄栅氧化层漏电流瞬态特性。
Secondly, the transient characteristics of FN tunneling and hot hole (HH) stress induced leakage current (SILC) in ultra-thin gate oxide are investigated respectively in this dissertation.
其次,本文分别研究了FN隧穿应力和热空穴(HH)应力导致的超薄栅氧化层漏电流瞬态特性。
应用推荐