In moderate field region, traps can be filled by both FN current and direct tunneling of electron into the traps. It results in a quasi-saturation in the leakage current.
在中等电场区域，注入电子能通过FN电流和直接隧穿到达能被填充的陷阱，从而使漏电流产生准态饱和。
With the rapid scaling down of MOS devices, the direct tunneling current becomes the main factor for MOS device reliability instead of FN tunneling.
随着器件尺寸的迅速减小，直接隧穿电流将代替FN电流而成为影响器件可靠性的主要因素。
Secondly, the transient characteristics of FN tunneling and hot hole (HH) stress induced leakage current (SILC) in ultra-thin gate oxide are investigated respectively in this dissertation.
其次，本文分别研究了FN隧穿应力和热空穴（HH）应力导致的超薄栅氧化层漏电流瞬态特性。
FN 25 seam welder which was remaked was fitted with the control system. Current percentage control model was adopted in the control system. Besides, the operating process was simplified.
控制系统配用经过改造的FN -25型缝焊机，采用了电流百分数的控制方式，简化了操作过程。
FN 25 seam welder which was remaked was fitted with the control system. Current percentage control model was adopted in the control system. Besides, the operating process was simplified.
控制系统配用经过改造的FN -25型缝焊机，采用了电流百分数的控制方式，简化了操作过程。
应用推荐