Finally, the application of DLC films was introduced briefly.
最后，简要说明了非晶碳类金刚石膜应用情况。
The problems of applying DLC films in dies were also discussed.
分析了目前类金刚石膜在模具上的应用和推广中存在的障碍。
DLC films were prepared on silicon by pulse-arc plasma deposition.
利用脉冲多弧离子镀技术在硅基底上沉积类金刚石薄膜。
The mechanism for depositing the DLC films was also discussed in detail.
同时对相应的成膜机理进行了讨论。
Phosphorus doped DLC films have good blood compatibility and low resistivity.
掺磷DLC膜电阻率小，还可以明显提高其血液相容性；
The surface energy of DLC films is dependent on the carbon bonds and surface roughness.
DLC薄膜表面能高低取决于表面碳碳键与粗糙度的变化。
But DLC films have some defects and can not be sufficient for special needs in industries.
但是DLC薄膜也存在某些缺陷，尚无法满足工业上的一些特殊要求。
DLC films can be deposited by changing technology, such as voltage, distance and temperature.
通过控制电压、电极间距、温度等电解工艺条件，在钛合金表面沉积得到DLC膜。
The structural and property characteristics of DLC films and the related structural models are introduced.
阐述了DLC 膜的结构和性能特征及相关的结构模型。
Finally the effect of technical parameters on the properties of DLC films were discussed with measure results.
通过测试结果分析讨论了工艺参数对DLC薄膜性能的影响。
The effect of technical parameters on deposition rate, hardness and surface roughness of DLC films were researched.
并研究了工艺参数对薄膜沉积速率、硬度和表面粗糙度的影响。
Recently years, the tribological properties of DLC films can be improved by adding other metal or non-metal elements.
因此近年已经开始了在DLC薄膜中掺杂金属或非金属元素的研究。
Application of DLC films deposited by liquid-deposition is now limited to electronics and has not begun as biomaterial.
而且液相法dlc膜的应用研究仅限于电子学等方面，在生物材料方面的应用研究尚未开始。
A possible growth mechanism of DLC films is proposed based on the structure and physical properties of dimethylsulfoxide.
并从二甲亚砜的分子结构及其物理性质对薄膜的沉积的机制进行了探讨。
When the incident laser's wavelength lies outside the infrared system response wave band, laser destroys the DLC films firstly.
当入射的激光波长位于红外系统响应波段外时，激光对系统的破坏首先是激光对DLC薄膜的破坏。
The mechanical properties of DLC films and the current status of research and applications in tools are reviewed in this paper.
阐述了类金刚石膜的力学性能和类金刚石膜工具的应用及研究现状。
In order to improve these properties of DLC films, metal doped DLC films have been becoming an important topic of people's study.
为了改善DLC膜的性能，掺金属的类金刚石薄膜从而成为人们研究的重点。
X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the chemical structure of the DLC films containing ti.
通过X射线光电子能谱及X射线衍射表征了薄膜的化学结构。
ZHOU S, YAN Y X. Structure and mechanical properties of DLC films by pulsed vacuum arc ion deposition[J]. Vacuum, 2005,42(2):15-18.
[12] 周顺，严一心。脉冲真空电弧离子镀在不锈钢上沉积类金刚石薄膜的研究[J]。真空，2005，42（2）：15-18。
The effect of hydrogen on stability of diamond and the influences of deposition condition on properties of DLC films are discussed.
讨论了氢原子对金刚石结构的稳定作用，并解释了实验条件对膜结构和性能的影响。
It is indicated that DLC films can be deposited in liquid phase by choosing appropriate electrolyte and preparing technology by electrodeposition method.
本文通过实验表明采用电化学淀积法，选择合适的电解质溶液和制备工艺条件，可以在液相中获得类金刚石薄膜。
Both RF power and pressure have distinct influence on radical's species and proportion in the DLC films deposition process, and the film's quality is affected finally.
而且射频功率、沉积气压等沉积参数的变化对DLC薄膜沉积过程的中性基团、离子基团以及原子氢等成分都有着明显影响，从而最终影响薄膜沉积过程及薄膜性质。
It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.
在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善DLC膜的性质有重要意义。
The method for the drposition of large area and homogeneous DLC films is described. Problems faced with in the further development and application of the films are also discussed.
文中还提出了在类金刚石薄膜进一步开发、研究及应用中仍需解决的一些工艺及技术问题，描述了制备大尺寸均匀性类金刚石薄膜的可行性方案。
Using TEM, XPS and Raman spectroscopy, we analysed the microstructure of the DLC films. It was found that DLC films were mixed carbon films containing diamond and other carbon phase.
利用透射电镜、X射线光电子能谱及拉曼光谱等分析手段对该膜进行了显微结构分析，发现类金刚石膜是含有金刚石及其它碳相的混合碳膜。
DLC films and gradient composition DLC films were deposited on si substrates in plasma-ion beam enhanced deposition system for the industrial applications and improving the adhesion.
本文基于产业化应用和改善类金刚石膜与基体结合力为目的，在大型工业用等离子体—离子束增强沉积系统中，获得了DLC膜和梯度复合dlc膜。
Molecular dynamics simulations are performed to study the growth of diamond_like carbon (DLC) films on the atomic scale.
利用分子动力学模拟方法，从原子尺度上研究了类金刚石（DLC）薄膜生长过程。
Diamond-like carbon DLC thin films were deposited onto si 100 and high speed steel substrates by mid-frequency magnetron sputtering system SP0806AS, Beijing Power tech Co.
采用SP0806AS中频磁控溅射镀膜机，在硅(100)和高速钢基体上，采用双石墨靶在不同功率下沉积了类金刚石薄膜。
The hydrogen-free diamond-like carbon(DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering.
利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。
This system can be used in research of high-resistance materials such as thin dielectric layers on semiconductors, DLC and piezo-films, conductive polymers etc.
这套系统可以用于研究高电阻的材料，例如在半导体基体上的绝缘薄膜，DLC和压电薄膜，导电聚合物等。
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