In laboratory cell was obtained dense, flat and smooth cathode deposit.
在实验室电解槽中获得了致密、平整和光滑的阴极沉积物。
Direct current hot cathode plasma glow discharge chemical vapor deposition (DC-HCPCVD) is a new method to deposit high quality diamond films with high growth rate.
直流热阴极辉光放电等离子体化学气相沉积法是我们建立的快速沉积高品质金刚石膜的新方法。
Hot cathode chemical vapor deposition method was established in order to deposit high-quality diamond films with high deposition rate.
为快速沉积高品质金刚石膜，建立了热阴极等离子体化学气相沉积方法。
This paper analyzed the reasons and hazards of the saline alkaline crystal deposit in the hydrogen channel inside cathode chamber and introduced some elimination methods for it.
分析了阴极箱氢通道积存盐碱结晶的原因和危害，提出了消除的措施。
During the electroforming, the current density distribution on the cathode surface is decided by the anode profile and its position, which will influence the uniformity of the deposit finally.
在电铸过程中，电铸阳极的轮廓和位置决定了阴极表面电流密度的分布，并最终影响电铸层的均匀性。
The flowing direction of the solution from top to bottom is beneficial for the deposition of the deposit so as to reduce the influence of the floating of the deposit on the cathode quality.
溶液的流动方向由上而下有利于沉淀物的沉降，减少沉淀物漂浮对阴极质量的影响。
Hole forming by the way of nickel deposit onto the copper cathode.
在这个工艺中，镍沉积在铜质的阴 极心上以形成开孔。
Hole forming by the way of nickel deposit onto the copper cathode.
在这个工艺中，镍沉积在铜质的阴 极心上以形成开孔。
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