The composition generally changes from alloy cathode target to alloy coating deposited by multi arc ion plating to some extent.
采用多弧离子镀制备的合金涂层成分与合金阴极靶之间通常存在一定程度的偏差。
The plasma source ion implantation device consists of pulsed negative high voltage power, hot cathode arc discharge system, vacuum chamber and target stage, vacuum system and monitor system.
等离子体源离子注入装置由脉冲负高压源系统、热阴极弧放电系统、真空室及样品台、真空系统和监测系统等五部分组成。
A new multiple hollow cathode sputtering target which has a simple structure and a high sputtering rate, was put forward.
研制了一种由多个空心阴极并列组合而成的可直接作为溅射靶的多重空心阴极溅射靶。
The planar magnetic control spluttering cathode mainly solves the technical problem of relatively low utilization ratio of the target of the prior planar cathode.
它主要是解决现有平面阴极的靶材利用率相对较低等技术问题。
The new concept of the vacuum pipe sputter self-coating is introduced first, and special cathode target structure is introduced to get favorable coating.
首先提出真空管道自体真空镀膜新概念，采用特殊的阴极靶结构设计成功的解决了长管道内表面直流溅射镀膜的难题。
A new net-shape cathode sputtering target which has a simple structure and a high sputtering rate was put forward.
设计了一种网状阴极溅射靶，它是由多个空心阴极并列交叉组合而成。
This demixing effect leads to the difficulties in the control of alloy composition of coating and in the design of composition of alloy cathode target.
这种离析效应导致了合金涂层成分控制及合金靶材成分设计的困难。
The plasma can be 4 generated by hot-cathode discharge or RF discharge of gas. In addition, the device has four metal plasma sources, two magnetron sputtering targets, cold and hot target supports.
真空室内的气体等离子体可由热灯丝或射频放电产生，4另外还配置了4个金属等离子体源、两套磁控溅射靶和冷却靶台。
The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。
The evaluating method of sputtering cleanout effect on metal target surface by volt-ampere characteristic of target cathode has been given, which provides effective approach to eliminate...
给出了金属靶阴极表面溅射清洗效果的伏安特性评价法，为克服“靶中毒”提供了有效的技术途径。
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