纳米压印作为非光学的下一代光刻技术，具有分辨率高、成本低、产率高等诸多优点，因而可能应用于将来的半导体制造中。
Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.
纳米压印作为非光学的下一代光刻技术，具有分辨率高、成本低、产率高等诸多优点，因而可能应用于将来的半导体制造中。
Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.
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