由于RTA的均匀化作用，氧化硅片表层的铁浓度显著低于氧化刚结束时硅片表层的铁浓度。
The iron concentration in the superficial layer of oxidized wafers after RTA decreases as a result of the homogenization effect of RTA.
由于RTA的均匀化作用，氧化硅片表层的铁浓度显著低于氧化刚结束时硅片表层的铁浓度。
The iron concentration in the superficial layer of oxidized wafers after RTA decreases as a result of the homogenization effect of RTA.
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