采用射频磁控溅射技术在不同射频功率下沉积了ITO薄膜，并将其应用于HIT太阳电池。
ITO thin films were prepared by radio-frequency magnetron sputtering technique at different sputtering power, and applied to HIT solar cells.
在石英衬底上采用射频磁控溅射的方法制备高电阻azo薄膜，其中高电阻由高氧氩比环境得到。
High resistance AZO films are fabricated on quartz substrates by radiofrequency (RF) magnetron sputtering deposition method in the environment with high oxygen proportion.
采用射频磁控溅射法沉积了CN薄膜，利用XPS,XRD,FTIR等测试手段研究了CN薄膜的成分和结构。
CN films were deposited by radio frequency sputtering technique and the composition and structure of it were investigated by means of XPS, XRD and FTIR.
所有样品采用射频辅助磁控溅射方法制备。
All samples were prepared by rf magnetron sputtering method.
采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。
Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
采用四极质谱仪测量了试验参数对高压脉冲增强射频磁控溅射ptfe靶等离子体气氛的影响规律。
Quadrupole mass spectrometer was used to analyze the plasma environment of RF magnetron sputtering PTFE target with pulsed bias.
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