本文提出了用等离子体蚀刻法提高浮雕全息光栅衍射效率的原理和方法。
The principle and method to improve the diffraction efficiency of relief holographic gratings by plasma etch is presented in this paper.
本文提出了用等离子体蚀刻法提高浮雕全息光栅衍射效率的原理和方法。
The principle and method to improve the diffraction efficiency of relief holographic gratings by plasma etch is presented in this paper.
应用推荐