用一个冷阴极离子枪产生的氧离子轰击淀积过程中的薄膜表面。
Oxygen ions from a cold cathode ion-gun have been used tor bombarding the growing thin films.
这些陷阱可能是在不同生长条件的介质膜淀积过程中等离子体引进的有关辐照损伤。
The origin of these traps might be due to irradiation damage induced by plasma during insulating layer growth process.
在离子束溅射石墨靶淀积dlc膜的同时用离子束轰击，对于拓宽和改善DLC膜的性质有重要意义。
It is of great importance to improve the properties of DLC films deposited with simultaneous ion bombardment du-ring film growth by ion beam sputtering on graphite target.
对于高斯型分布的微细离子柬注入，对其径向坐标的随机抽样作了模拟分析，结果表明横向分布与束半径密切相关，并且横向能量淀积的峰值位置就在束半径附近。
The results show that the transverse profile is correlative with the ion beam radius, and the top position of the energy deposition distribution is near the ion beam radius.
微波电子回旋共振等离子体是淀积薄膜、微细加工和材料表面改性的一种重要手段。
The microwave electron cyclotron resonance (ECR) plasma is one of the most important means for depositing thin films and microfabrications as well as surface modifications of materials.
可用于单离子注入，离子束混合，单离子或反应离子束溅射淀积以及离子束增强淀积。
It can be used for single ion implantation, ion beam mixing, single ion or reactive ion beam sputter-deposition and ion beam enhanced deposition.
具有淀积温度低，没有高能离子撞击损伤，淀积面积大，操作简单，微机程序控制，节约能源等优点。
The utility model has the advantages of low deposition temperature, no high-energy ion impact damage, large deposition area, simple operation, microcomputer programmed control, energy saving, etc.
具有淀积温度低，没有高能离子撞击损伤，淀积面积大，操作简单，微机程序控制，节约能源等优点。
The utility model has the advantages of low deposition temperature, no high-energy ion impact damage, large deposition area, simple operation, microcomputer programmed control, energy saving, etc.
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