研究了反应磁控溅射的动力学过程。
The kinetic process of reactive magnetron sputtering has been studied.
所有样品采用射频辅助磁控溅射方法制备。
All samples were prepared by rf magnetron sputtering method.
本文介绍了等离子增强磁控溅射沉积技术。
This article presents an introduction to Plasma enhanced, magnetron sputtered deposition Technology.
反应磁控溅射被广泛应用于制备化合物薄膜。
Reactive magnetron sputtering was used to prepare many kinds of compound films extensively.
利用低频反应磁控溅射制备五氧化二铌光学薄膜。
Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
磁控溅射已经成为沉积薄膜的最重要的方法之一。
Magnetron sputtering has become one of the most important methods for depositing thin films.
本文介绍了一种中频交流脉冲式磁控溅射靶极电源。
An alternative current medium frequency pulsed magnetron sputtering cathode power supply was introduced.
提出并研制成功了一种新型旋转圆柱形磁控溅射器。
A new rotating cylindric magnetron sputtering is presented and successfully pro - duced by ourselves.
对使用磁控溅射法沉积的钨薄膜进行了热退火研究。
We employ the magnetic sputtering method to deposit amorphous tungsten films and investigate their thermal annealing process.
该电源为磁控溅射镀膜设备实现自动控制提供了方便。
The power supply will be convenient for controlling the magnetron sputtering coater automatically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。
The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
本文论述了在空心微珠表面磁控溅射镀金属薄膜的方法。
High quality nickel films have been successfully plated on cenosphere particles by dc magnetron sputtering at mom temperature.
用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering.
采用磁控溅射法制备锰铜薄膜，溅射和真空蒸发法制备镱薄膜。
Thin film manganin gages and ytterbium gages were fabricated by magnetron sputtering.
对铀表面磁控溅射沉积铝镀层的热应力进行了热弹塑性有限元分析。
The thermal stress in magnetron sputtered al coating on uranium substrate was studied by thermal elastic plastic finite element method (FEM).
利用微波ecr等离子体增强磁控溅射沉积技术在玻璃表面制备了硅膜。
The silicon thin films on glass substrate were prepared using microwave ECR plasma source enhanced magnetron sputtering.
采用直流磁控溅射法溅射纯度为99.999%的铝靶制备了超薄铝膜。
Ultrathin aluminum films were prepared by DC reactive magnetron sputtering. The target was made by 99.999% pure aluminum.
采用直流磁控溅射工艺，室温下在载玻片上制备了氧化锌铝透明导电薄膜。
ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
本文从工厂应用的角度着重讨论磁控溅射镀膜机镀氮化钛装饰膜的工艺问题。
With the view of the application in factory, the process of tin decorative coating coated by magnetron sputtering coater is emphatically discussed in this paper.
本文主要论述基板负偏压与A 3钢基体磁控溅射离子镀铝膜相组成的关系。
This paper mainly deals with the relationship between negative bias of substrate and component phases of magnetron-sputtering ion plated aluminium film of A3 steel.
采用磁控溅射方法制备金属锑薄膜，并把它作为锂离子二次电池负极进行研究。
Metallic antimony thin film was deposited by magnetron sputtering and it was investigated as anode materials for lithium-ion batteries.
与常规的圆柱形磁控溅射靶相比较，该旋转式靶提高了靶材利用率和膜厚均匀度。
This revolving target improved on the usage of target material and uniformity of film thickness comparing with conventional cylindric magnetron sputtering target.
文中介绍采用可编程序控制器改进单机单片磁控溅射真空镀膜机的设计和运行情况。
The design and running state which PLC improved magnetic - control vacuum membrane plate machine has been introduced.
本文利用射频磁控溅射方法，在微通道板输入面上成功地制备出二氧化硅防离子反馈膜。
Silicon oxide ion barrier film was successfully fabricated on the input-face of microchannel plate by magnetron sputtering method.
阐述了影响激光反射膜损伤阈值的因素以及反应磁控溅射制备高阈值激光反射膜的优势。
The factors that affect the damage threshold and the advantage of RMS in laser reflective film preparation are also discussed.
制备表面抗菌不锈钢的方法有化学热处理、磁控溅射、离子注入、溶胶-凝胶和化学沉积。
There are various methods to obtain antibacterial surface on stainless steels, such as chemical heat treatment, magnetron sputtering, ion implantation, Sol-Gel, and chemical deposition.
磁控溅射技术是现代材料制备的重要方法之一，特别是在薄膜的制备过程中显得更为重要。
The technology of magnetron sputtering is an important method of preparing new materials in modern times, especially in the process of preparation of films.
综述了各种沉积条件对磁控溅射技术生长氮化铝薄膜的微观结构，电学以及光学性能的影响。
Reviewed were the effects of various deposition conditions on microstructural, electrical and optical properties of AlN films grown by magnetron sputtering deposition technology.
以磁控溅射沉积方法，采用循环氩离子轰击镀和未循环轰击镀工艺在金属铀上制备了铝薄膜。
Aluminum film on uranium is prepared using magnetron sputtering with and without circulated argon ion bombardment process.
以磁控溅射沉积方法，采用循环氩离子轰击镀和未循环轰击镀工艺在金属铀上制备了铝薄膜。
Aluminum film on uranium is prepared using magnetron sputtering with and without circulated argon ion bombardment process.
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