研究了基片摆动和基片自转的磁控溅射系统中基片摆动角振幅和基片自转角速度对磁控溅射膜厚均匀性的影响。
The influence of rotation speed and pendulum amplitude on the thickness uniformity of film deposited by radio frequency magnetron sputtering system with rotation and pendulum was researched.
介绍了基于FPGA的太阳能真空集热管磁控溅射镀膜机控制系统的整体设计和工程实现过程。
This paper introduces an integrated design and implementation of the SCS control system based on FPGA.
该系统集脉冲阴极弧离子镀、直流阴极弧离子镀、磁控溅射和电子束蒸发等镀膜工艺以及气体和金属离子注入于一体。
The system include pulse cathodic arc ion deposition, direct current cathodic arc ion deposition, magnetic sputtering and electronic beam evaporation technologies.
摘要：本文详细介绍了气体离子源增强磁控溅射(气离溅射)反应离子镀膜技术和系统配置。
ABSTRACT: in this paper a reactive ion plating method and system configuration of Gas ion source enhanced Magnetron Sputtering (GIMS) is presented in details.
作为重点，对真空室、真空系统、工件架、磁控溅射靶、控制系统等进行了相应的设计分析和计算。
Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.
作为重点，对真空室、真空系统、工件架、磁控溅射靶、控制系统等进行了相应的设计分析和计算。
Special importance were attached to the design and calculation of deposition chamber, vacuum system, sample system, sputtering cathode and control system.
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