提出并研制成功了一种新型旋转圆柱形磁控溅射器。
A new rotating cylindric magnetron sputtering is presented and successfully pro - duced by ourselves.
文中介绍采用可编程序控制器改进单机单片磁控溅射真空镀膜机的设计和运行情况。
The design and running state which PLC improved magnetic - control vacuum membrane plate machine has been introduced.
文中介绍采用可编程序控制器改进单机单片磁控溅射真空镀膜机的设计和运行情况。
The design and running state which PLC improved magnetic - control vacuum membrane plate machine has been introduced.
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