源气体及组分的选择是硅槽刻蚀技术的关键因素。

Correct selection of source gases and their compositions is one of the critical factors for si trench etching.

youdao

源气体及组分的选择是硅槽刻蚀技术的关键因素。

Correct selection of source gases and their compositions is one of the critical factors for si trench etching.

youdao