其它硅化物层(50.4 - 50.6)处于源极、漏极和多晶硅栅极的顶部。

Other silicide layers (50.4-50.6) are on the tops of the source, drain and polysilicon gate.

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其它硅化物层(50.4 - 50.6)处于源极、漏极和多晶硅栅极的顶部。

Other silicide layers (50.4-50.6) are on the tops of the source, drain and polysilicon gate.

youdao