本发明涉及一种阳极板及一种包括所述阳极板的溅镀装置。
The present invention relates to a kind of anode plate and its sputtering apparatus.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
本发明涉及一种高真空离子束溅镀靶材利用率增强装置。
The invention relates to a device for improving utilization rate of a high vacuum ion beam sputtering target material.
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