也可以使用气相二氧化硅。
主要了介绍气相二氧化硅在胶体蓄电池中的应用。
The application of fumed silica in gel battery is introduced in detail in this paper.
着重研究了气相二氧化硅填料的加入对光纤涂料性能的影响。
The effects of gas silicon dioxide on the properties of UV-curable optical fiber were studied.
气相二氧化硅具有比表面积大、纯度高，良好的触变性能等特性。
Fumed silica has the following unique characteristics: large specific surface area, high purity, better thixotropic performance and so on.
讨论了导电氧化锌晶须、气相二氧化硅和偶联剂对涂料性能的影响。
The influences of zinc oxide crystal whisker, fumed silica and coupling agent on coatings performance were discussed.
作为一种理想的触变和增稠材料，气相二氧化硅在复合材料中有着广泛的应用。
As an ideal rheological and thickening material, fumed silica has a wide range of applications in the composite materials even though there exist some problems while using the fumed silica.
介绍了气相法二氧化硅包装系统对产品质量的影响及新老设备的性能比较。
The influence of packing system of silica by gas phase method on products quality and the property comparison between new equipment and old equipment were introduced.
实验表明，气相法二氧化硅对提高聚氯乙烯糊树脂的发泡倍率起着重要作用。
Experiment results show that gas phase made silicon dioxide performs an important function in increasing the blowing rate of PVC paste resin.
并将无显影气相光刻的方法应用于这种二氧化硅膜的刻蚀，通过优化后的光刻工艺参数得到了反差明显的光刻图形。
The uniform sol gel derived silicon dioxide film was prepared under optimal conditions. DFVP was applied to etch this film. The photolithography patterns was obtained due to the different etch…
以硅烷和氧化二氮作为反应气体，采用等离子体增强化学气相沉积(PECVD)技术，不使用掺杂，在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。
Without doping, plasma enhanced chemical vapor deposition (PECVD) of silica films on si substrates with gas mixtures of SiH_4 and N_2O is considered.
以硅烷和氧化二氮作为反应气体，采用等离子体增强化学气相沉积(PECVD)技术，不使用掺杂，在单晶硅衬底上制备了用于平面光波导的二氧化硅薄膜。
Without doping, plasma enhanced chemical vapor deposition (PECVD) of silica films on si substrates with gas mixtures of SiH_4 and N_2O is considered.
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