本发 明在钽作为靶材在溅射机上使用，各方面性能达到设计要求。
The sputtering ring is used on the sputtering machine using tantalum as target, and performance on every aspect reaches the requirement of design.
本发 明在钽作为靶材在溅射机上使用，各方面性能达到设计要求。
The sputtering ring is used on the sputtering machine using tantalum as target, and performance on every aspect reaches the requirement of design.
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